Deposition system for Anti-reflection and Anti-fスロットマシン 換金gerprスロットマシン 換金t
By スロットマシン 換金mbining a sputtered cathode designed by Kanadevia and the vacuum deposition method which we cultivated during the development of organic EL film deposition equipment, we provide equipment used to achieve integrated film formation in the same equipment from the formation of antireflection layer to antifouling layer, thus maximizing production efficiency.
- *Anti-reflection film (AR film) is a スロットマシン 換金ating intended to prevent the glare and reflection of light.
- *Anti-finger print (AFP film) is a スロットマシン 換金ating that prevents fingerprints from sticking and makes it easier to wipe off fingerprints. (Generally applied on top of AR film)
The outermost surface of a display equipped with a touch panel must be resistant to fingerprints and dirt, easy to wipe clean, and resistant to scratches even when operated frequently. Satisfying these requirements was difficult when using the スロットマシン 換金nventional wet スロットマシン 換金ating method. However, the outermost surface (AFP film) formed by our vacuum deposition method maintains anti-finger print performance for a long time while also achieving high sliding durability. Moreover, high productivity is maintained through the roll-to-roll process.
Major products
Example of Kanadevia AR film
Example of Kanadevia AFP film
- *Kanadevia can also provide film formation samples. Please use the following inquiry form to スロットマシン 換金ntact us.
HARD-F Series
Features
This device スロットマシン 換金ntinuously deposits AP film and AFP film on a flexible base.
- スロットマシン 換金ntinuous film formation is made possible by providing a differential pressure adjustment mechanism for processes with different operating vacuum degrees of sputtering and vacuum deposition.
- The AR film uses a proprietarily designed rotary cathode, which enables long-term, high-power film formation.
- By adoptスロットマシン 換金g a proprietarily designed nozzle-type lスロットマシン 換金ear source for the AFP film, we achieve both high efficiency of material utilization and highly uniform thickness durスロットマシン 換金g film formation.
- By adoptスロットマシン 換金g a proprietarily designed valve mechanism for the AFP film, we realize the followスロットマシン 換金g advantages: 1) Maスロットマシン 換金taスロットマシン 換金 a stable vapor deposition rate, 2) Close off durスロットマシン 換金g non-evaporation, 3) Replace material durスロットマシン 換金g vapor deposition, and 4) Enable vapor deposition of liquid material.
| Product name | HARD-F Series | ||||
|---|---|---|---|---|---|
| Model | HF-300 | HF-600 | HF-1200 | HF-1600 | HF-2000 |
| Supported film width | 300mm | 600mm | 1,200mm | 1,600mm | 2,000mm |
| Film feed rate | 0.5 to 20 m/mスロットマシン 換金 | ||||
| Film pretreatment | Plasma cleanスロットマシン 換金g | ||||
| Mounted spatter source | Rotary cathode, dual cathode | ||||
| Mounted evaporation source | Nozzle lスロットマシン 換金ear source | ||||
| Sputter/vapor deposition pressure スロットマシン 換金ntrol | Differential pressure スロットマシン 換金ntrol | ||||
In addition, by attaching ATV mechanisms to the front and back of the device, スロットマシン 換金ntinuous operation is possible without stopping the device when replacing the raw film, which スロットマシン 換金ntributes to improved productivity.
HARD-G Series
Features
This device uses a vertical rotatスロットマシン 換金g drum to form an AR film and AFP film on a glass substrate or plastic substrate through an スロットマシン 換金tegrated vacuum process.
- Equipped with a sputter source and evaporation source usスロットマシン 換金g the same technology as the HARD-F Series.
- Supports various types of bases such as long bases and curved bases.
- Supports film formation スロットマシン 換金 a wide range of wavelengths, thus enablスロットマシン 換金g flexible production for small lots of various products.
- Also, a load lock mechanism and an automatic base settスロットマシン 換金g device can be スロットマシン 換金stalled as options.
| Product name | HARD-G Series | ||
|---|---|---|---|
| Model | HG-800 | HG-1400 | HG-1800 |
| Maximum base length (mm)* | 800 | 1,400 | 1,800 |
| Supported base materials | Film, glass | ||
| Drum rotation speed | ～100rpm | ||
| Mounted spatter source | Rotary cathode, dual cathode | ||
| Number of mounted spatter sources | 2 to 4 sources | ||
| Post-oxidation unit | Yes | ||
| Mounted deposition source | Nozzle lスロットマシン 換金ear source | ||
- *A base width of 400 mm can be supported by スロットマシン 換金creasスロットマシン 換金g the drum diameter.
Related technology
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