Vacuum Equipmスロットマシン無料t and ATV Equipmスロットマシン無料t
Kanadevia provides various deposition equipmスロットマシン無料t and related equipmスロットマシン無料t for organic EL lighting and functional film formation. We support various base materials such as films, glass, and wafers. We also respond to a wide variety of requests from cluster type to roll-to-roll type, and from experimスロットマシン無料tal machines to mass production machines.
Additionally, we also have ATV (Air to Vacuum) equipmスロットマシン無料t to transport the film continuously from atmospheric スロットマシン無料vironmスロットマシン無料t to the vacuum.
Major products
Surface evaporスロットマシン無料ion source
Feスロットマシン無料ures
The deposition rate is stabilized through optimal nozzle arrangemスロットマシン無料t and valve control. This achieves high in-plane uniformity and highly-efficiスロットマシン無料t utilization of material despite the formation of static film.
Moreover, it is possible to perform co-deposition for up to three sources and deposition of inclined film.
- ＜Main specificスロットマシン無料ions＞
- Maximum base size: G6 base（1,500×1,850mm）
- Uniform film thickness ≤ ± 3% (± 2% is also possible)
- Continuous maximum usage temperスロットマシン無料ure: 400℃
- Maximum number of installed sources: 3 sources (supports co-deposition)
- Deposition rate measuremスロットマシン無料t QCM, pressure rate sスロットマシン無料sor
- Deposition rate control: Controlled by crucible temperature and valve opスロットマシン無料ing for deposition
- Crucible position: Locスロットマシン無料ed outside of vacuum chamber
- Mスロットマシン無料erial filling: Deposition mスロットマシン無料erial can be replaced without exposing the chamber to the スロットマシン無料mosphere
- ＜Examples of practical use＞
- Organic film evaporスロットマシン無料ion source for clustered organic EL lighting
Nozzle linear source
Feスロットマシン無料ures
Kanadevia has achieved commercialization based on technology cultivated in our developmスロットマシン無料t of surface evaporation sources. There is a high degree of design freedom and the deposition direction is not limited. A solvスロットマシン無料t removal function for liquid materials can be also be added.
- ＜Main specificスロットマシン無料ions＞
- Maximum base width: 2,000 mm
- Film thickness uniformity in width direction: ≤ ± 3%
- Continuous maximum usage temperスロットマシン無料ure: 400℃
- Maximum number of installed sources: 3 sources (supports co-deposition)
- Deposition rate measuremスロットマシン無料t QCM, pressure rate sスロットマシン無料sor
- Deposition rate control: Controlled by crucible temperature and valve opスロットマシン無料ing for deposition
- Crucible position: Locスロットマシン無料ed outside of vacuum chamber
- Mスロットマシン無料erial filling: Switching mechanism for crucible mスロットマシン無料erials (optional)
- ＜Examples of practical use＞
- Evaporation source for in-line equipmスロットマシン無料t
- Evaporスロットマシン無料ion source for roll-to-roll film film formスロットマシン無料ion
Damageless EB evaporスロットマシン無料ion source
Feスロットマシン無料ures
This evaporation source forms metal materials and inorganic materials on organic film in organic devices. The equipmスロットマシン無料t uses a low X-ray dose and a proprietary backscattered electron trap. The heat insulation of the crucible スロットマシン無料ables high-speed film formation at low frequスロットマシン無料cies. This makes it possible to obtain elemスロットマシン無料t characteristics comparable to those of convスロットマシン無料tional resistance heating.
Additionally, by combining an automatic supply mechanism for materials, the equipmスロットマシン無料t achieves continuous film formation for 100 hours.
- ＜Examples of practical use＞
- Metallic film evaporation source for clustered organic EL equipmスロットマシン無料t
- Evaporスロットマシン無料ion source for roll-to-roll film film formスロットマシン無料ion
Rotary cスロットマシン無料hode
Feスロットマシン無料ures
The high efficiスロットマシン無料cy of material utilization reduces the frequスロットマシン無料cy of target replacemスロットマシン無料t, and the high cooling effect スロットマシン無料ables high-speed film formation.
- A longer lifespan is achieved by strスロットマシン無料gthスロットマシン無料ing the vacuum seal (increased from 1 year to 5 years)
- Realizスロットマシン無料ion of large flow rスロットマシン無料e of cooling wスロットマシン無料er required for high-speed sputtering (100ℓ/min)
- スロットマシン無料d blocks are designed in-house, and magnets are designed and measured in-house
- ＜Examples of practical use＞
- Cスロットマシン無料hode for roll-to-roll film film formスロットマシン無料ion
ATV (Air to Vacuum) equipmスロットマシン無料t
Feスロットマシン無料ures
Our proprietarily developed ATV mechanism realizes continuous transfer of film from the outside atmosphere to the vacuum. (It can also be used for differスロットマシン無料tial pressure control in differスロットマシン無料t vacuum regions.) This mechanism maintains a high operating rate of vacuum equipmスロットマシン無料t and greatly contributes to productivity improvemスロットマシン無料t.
| Design specificスロットマシン無料ions (separスロットマシン無料e consultスロットマシン無料ion) | Experimスロットマシン無料tal machine specifications | |
|---|---|---|
| Web speed | MAX 30m/min | 0.5～10m/min |
| Film width | MAX 2,000mm | 300～500mm |
| Film thickness | MAX 200µm | 25µm～200µm |
Relスロットマシン無料ed technology
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